多维复用硅基集成光子器件

[摘要] 从波长、模式、偏振几个维度的复用/解复用和路由出发，分别提出了新颖的器件设计方法并制作了相应的硅基光子器件，包括：阵列波导光栅器件（AWG）/刻蚀衍射光栅器件（EDG）、模式分离合束器件、偏振分离耦合光栅、偏振分离/分离旋转器件。AWG可以采用一步刻蚀简单工艺制作形成，EDG插损得到大幅降低，模式分离器件带宽增大，插损也得到降低，偏振分离耦合光栅的耦合效率得到有效提升，偏振分离/旋转器件的插损和带宽也被显著改进。以上器件全部符合互补金属氧化物半导体（CMOS）-180 nm工艺标准，这些器件的研制工作为多维度光波复用/解复用处理及传输提供了先进的器件技术保障。

[关键词] 波长复用/解复用；模式复用/解复用；偏振控制；硅光器件

[Abstract] In this paper, various silicon photonic devices designed for wavelength/mode/polarization multiplexing/demultiplexing are proposed, including arrayed waveguide grating (AWG) and etched diffraction grating (EDG), mode Mux/DeMux devices, polarization splitting grating coupler, and polarization splitting rotating device. With these novel devices, the following results can be achieved: (1) AWG could be formed by single step etching process; (2) EDG insertion loss is greatly reduced; (3) mode splitting device bandwidth increases, while the insertion loss is reduced; (4) the coupling efficiency of the polarization splitting grating coupler is effectively improved; (5) the insertion loss and bandwidth of the polarization splitting rotating device are also significantly improved. It is believed that the Mux/DeMux technologies on dimensions of wavelength/mode/polarization will be strongly supported by these silicon photonic devices, which are compatible with complementary metal oxide semiconductory (CMOS)-180 nm processing technologies.

[Keywords] wavelength Mux/DeMux; mode Mux/DeMux; polarization controlling; silicon photonic devices